Rapid thermal annealing: An efficient method to improve the electrical properties of tellurium compensated Interfacial Misfit GaSb/GaAs heterostructures

dc.contributor.authorAziz, Mohsin
dc.contributor.authorFelix, Jorlandio F.
dc.contributor.authorJameel, Dler
dc.contributor.authorAl Saqri, Noor
dc.contributor.authorAl Mashary, Faisal S.
dc.contributor.authorAlghamdi, Haifaa M.
dc.contributor.authorAlbalawi, Hind M.A.
dc.contributor.authorTaylor, David
dc.contributor.authorHenini, Mohamed
dc.date.accessioned2018-09-11T18:12:01Z
dc.date.available2018-09-11T18:12:01Z
dc.date.issued2015-12
dc.description.abstractThe effect of thermal annealing on Te compensated Interfacial Misfit GaSb/GaAs heterostructures is investigated by using two different thermal annealing procedures, namely rapid thermal annealing and furnace annealing. The electrical properties of the devices are studied by using Current–Voltage, Capacitance–Voltage and Deep Level Transient Spectroscopy techniques. It is observed that rapid thermal annealing treatment is superior in terms of improvement of the electrical characteristics compared to furnace annealing treatment. The lowest leakage current and defect concentration are obtained when rapid thermal annealing is employed.en
dc.formatpdfpt-BR
dc.identifier.issn07496036
dc.identifier.urihttps://doi.org/10.1016/j.spmi.2015.08.028
dc.identifier.urihttp://www.locus.ufv.br/handle/123456789/21757
dc.language.isoengpt-BR
dc.publisherSuperlattices and Microstructurespt-BR
dc.relation.ispartofseriesv. 88, p. 80- 89, december 2015pt-BR
dc.rightsElsevier Ltd.pt-BR
dc.subjectRapid thermal annealingpt-BR
dc.subjectFurnace annealingpt-BR
dc.subjectIVpt-BR
dc.subjectCVpt-BR
dc.subjectDLTSpt-BR
dc.titleRapid thermal annealing: An efficient method to improve the electrical properties of tellurium compensated Interfacial Misfit GaSb/GaAs heterostructuresen
dc.typeArtigopt-BR

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