Low-field microwave absorption and magnetoresistance in iron nanostructures grown by electrodeposition on n-type lightly doped silicon substrates

dc.contributor.authorFelix, J. F.
dc.contributor.authorFigueiredo, L. C.
dc.contributor.authorMendes, J. B. S.
dc.contributor.authorMorais, P. C.
dc.contributor.authorAraujo, C. I. L. de
dc.date.accessioned2018-09-11T18:00:50Z
dc.date.available2018-09-11T18:00:50Z
dc.date.issued2015-12-01
dc.description.abstractIn this study we investigate magnetic properties, surface morphology and crystal structure in iron nanoclusters electrodeposited on lightly doped (100) n-type silicon substrates. Our goal is to investigate the spin injection and detection in the Fe/Si lateral structures. The samples obtained under electric percolation were characterized by magnetoresistive and magnetic resonance measurements with cycling the sweeping applied field in order to understand the spin dynamics in the as-produced samples. The observed hysteresis in the magnetic resonance spectra, plus the presence of a broad peak in the non-saturated regime confirming the low field microwave absorption (LFMA), were correlated to the peaks and slopes found in the magnetoresistance curves. The results suggest long range spin injection and detection in low resistive silicon and the magnetic resonance technique is herein introduced as a promising tool for analysis of electric contactless magnetoresistive samples.en
dc.formatpdfpt-BR
dc.identifier.issn03048853
dc.identifier.urihttps://doi.org/10.1016/j.jmmm.2015.07.061
dc.identifier.urihttp://www.locus.ufv.br/handle/123456789/21754
dc.language.isoengpt-BR
dc.publisherJournal of Magnetism and Magnetic Materialspt-BR
dc.relation.ispartofseriesv. 395, p. 130- 133, december 2015pt-BR
dc.rightsElsevier B.V.pt-BR
dc.subjectSilicon substratespt-BR
dc.subjectLow-field microwavept-BR
dc.titleLow-field microwave absorption and magnetoresistance in iron nanostructures grown by electrodeposition on n-type lightly doped silicon substratesen
dc.typeArtigopt-BR

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